Measurement of Radiative Properties for Wafer and Heating System in Rapid Thermal Processing Furnace
碩士 === 國立交通大學 === 機械工程系 === 87 === The current trends in the development of microelectronics are the decrease in the size of integrated circuit elements and fabrication processing controls of the thermal budget. This has stimulated a considerable interest in transient methods of thermal processing,...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/67613354526756039177 |