Chemical Vapor Deposition of Tantalum Carbonitride and Tantalum Oxide Thin Films from Alkylamido Tantalum Complex.
碩士 === 國立交通大學 === 應用化學系 === 87 === In this research, we used pentakis(ethylmethyl-amido) tantalum as precursor with different carrier gas (H2 and Ar) to deposit tantalum carbonitride thin film and with O2 as reactive gas to deposit tantalum oxide thin film by low-pressure chemical vapor d...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/31631190922368428990 |