TEM Investigation on As Precipitation in Low-Temperature Grown III-V Arsenides

博士 === 國立中央大學 === 電機工程研究所 === 87 === This dissertation includes a general qualitative model, involving both vacancy and As antisite defects to model the distribution of As precipitates in LT-grown III-V arsenides after annealing. During the thermal treatment, excess As tends to diffuse from a As-ric...

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Bibliographic Details
Main Authors: Mao-Nan Chang, 張茂男
Other Authors: K. C. Hsieh
Format: Others
Language:en_US
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/19320131510806492664