Thin-Film LED and Transistor Fabricated by Using a
碩士 === 國立中央大學 === 電機工程研究所 === 87 === The conventional plasma-enhanced chemical vapor deposition (PECVD) system with an additional stainless steel (s.s.) mesh attached to cathode was used to fabricate Si-based thin-film light-emitting diode (TFLED) at a low substrate temperature (~180 ℃). The obtaine...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/73885707846186406838 |