The reseach of low loss optical thin film and its application by ion beam sputtering deposition
碩士 === 國立中央大學 === 光電科學研究所 === 87 === Low loss thin films,include titanium dioxide, tantalum pentoxide, niobium pentoxide and silicon dioxide, were deposited by ion beam sputtering deposition with a Kaufman-type ion source. There is optimium condition and analyzed its optical characteristi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/44428107908675073132 |