Plasma-Enhanced Chemical Vapor Deposition of SiO2 and Si(C,N) Thin Films
碩士 === 國立東華大學 === 材料科學與工程研究所 === 87 === Thin film technology has been widely applied in semiconducting and electro-optic industries and on the fine machinery to have materials in a small size and/or in new functions with high pay-off. In this study, plasma-enhanced chemical vapor deposition (PECVD)...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/32260873031459509387 |