二氧化矽化學氣相沉積之數值模擬

碩士 === 國立清華大學 === 動力機械工程學系 === 87 === An axisymmetric cylindrical numerical model is adopted in this study to simulate the CVD deposition process, based on the transport equations for mass, momentum, energy and species. The chemistry mechanism of this study is to investigate the depositio...

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Bibliographic Details
Main Author: 林鴻鈞
Other Authors: Chao-An Lin
Format: Others
Language:en_US
Online Access:http://ndltd.ncl.edu.tw/handle/22231585215165565967