A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes

碩士 === 國立清華大學 === 統計學研究所 === 87 ===

Bibliographic Details
Main Authors: Haw-Jyue Luo, 羅皓覺
Other Authors: Wun-Yi Shu
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/87839629011323846057