porous SiO2
碩士 === 國立清華大學 === 電子工程研究所 === 87 === The porous SiO2 films were fabricated by sol-gel method. The various ratio of C2H5OH, H2O, HCl, NH4OH to TEOS were prepared. Spin-coating, aging, drying and thermal treatment were applied. After the porous SiO2 films were formed, ellipsometer, Rutherford backscat...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
1999
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Online Access: | http://ndltd.ncl.edu.tw/handle/18372150403206315560 |