Heavily Boron Doped Silicon Layer Etching and Stress for MEMS Application
碩士 === 國立清華大學 === 電子工程研究所 === 87 === This thesis is dedicated to comprehensive study on etching and stress of the high doping P+ silicon film. We try to use four kinds of anisotropic etching solution to find out the suitable one in etching P+ silicon film. For film roughness and etching selectivity,...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/77220602056446718274 |