In-Situ Observation of the Etching Front During Sacrificial PSG Layer Removing in Hydrofluoric Acid
碩士 === 國立清華大學 === 電子工程研究所 === 87 === The sacrificial layer removal is one of the important processing steps in surface micromachining. There are a number of reports on the study of phosphosilicate-glass (PSG) etching in microchannels with HF-based solution. However, there are no consisten...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/76841160441678485152 |