Study of IMP Ta and TaNx as diffusion barrier layer in copper metallization

碩士 === 國立清華大學 === 工程與系統科學系 === 87 ===

Bibliographic Details
Main Authors: Graham Chuang, 莊景誠
Other Authors: F. R. Chen
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/70818139231678547980