Chemical-Mechanical Polishing Characterization of Low Dielectric Constant Polymers
碩士 === 國立臺灣大學 === 化學工程學研究所 === 87 === Low dielectric constant polymers have attracted extensive interest because they can minimize propagation delay, interconnect capacitance, and crosstalk between signal lines for deep sub-micro IC devices. Novel IC devices based on the structure of low...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/50098027788156128231 |