Development of the AlN/TaN and AlON/TaON Multilayer Films for the Attenuated Phase Shifting Mask
碩士 === 大同工學院 === 材料工程研究所 === 87 === We prepared AlN/TaN and AlON/TaON multilayer films by use of R.F magnetron sputtering system. By adjusting the material stoichiometry through controlled of sputter deposition parameters, those films could be tailored for specific optical application. Su...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/72094593130884155125 |