Preparation and Dry Etching Characteristics of Low Dielectric Constant Materials for ULSI Applications

碩士 === 中原大學 === 化學工程學系 === 88 === The purpose of this thesis is on the comparative analysis of the thermal stability and basic characteristics of FLARETM 2.0 and amorphous fluorocarbon film (a-C:F), which represent organic low-k polymers of two different deposition techniques. In FLARE 2.0, it was...

Full description

Bibliographic Details
Main Authors: Chi-Hung Liu, 劉志宏
Other Authors: Ta-Chin Wei
Format: Others
Language:zh-TW
Published: 2000
Online Access:http://ndltd.ncl.edu.tw/handle/80610369853966749754