Adhesion Behaviors of Thick Film Metallized AlN Substrate
碩士 === 義守大學 === 材料科學與工程學系 === 88 === The interfacial pore distribution, microstructure, and adhesive properties of an aluminum nitride (AlN) substrate screen-printed with resistor pastes have been investigated over a wide temperature range (600 ~ 850 oC). Some of the resistors have been doped with...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/28391973378611150919 |