The Effects of O2-Rapid Thermal Annealing on the Microstructural Properties, Conduction Mechanisms, and Reliability of Radio-Frequency-Sputtered TiO2 Thin Films
碩士 === 義守大學 === 電子工程學系 === 88 === Titanium dioxide (TiO2) thin films were reactively sputtered deposited on P+-type silicon substrate from a titanium dioxide target using Ar/O2 gas mixtures by reactive sputtering. The microstructural properties, conduction mechanisms, and reliability of sputtered Ti...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2000
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/74013828182309072849 |