Effects of Pulsed KrF Laser Irradiation and Ion Implantation on the Growth and Properties of Liquid-Phase-Deposited SiO2
碩士 === 國立成功大學 === 材料科學及工程學系 === 88 === Effects of the H2SiF6 concentration, pulsed KrF laser irradiation, and ion implantation on the growth and electrical properties of liquid phase deposition (LPD) SiO2 were studied. The F concentration in the LPD SiO2 increased with the H2SiF6 concentration, res...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/66118729964427498946 |