Effects of Ni Overlayer and Substrate Temperature on the Lateral Growth of Poly-Si by Pulsed KrFLaser Annealing
碩士 === 國立成功大學 === 材料科學及工程學系 === 88 === Effects of patterned Ni overlayer on the lateral growth of poly-Si were studied by pulsed KrF laser annealing as a function of the energy density and substrate temperature. Upon annealing the patterned Ni overlayer absorbed the laser energy to creat...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20027416484489902164 |