Characterization pf Plasma-Enhanced Chemical Vapor Deposition pf TiO2 Thin films
碩士 === 國立成功大學 === 材料科學及工程學系 === 88 === Titanium dioxide thin films were fabricated on the silicon substrates using plasma-enhanced chemical vapor deposition (PECVD) and low pressure chemical vapor deposition (LPCVD). The refractive index, crystal structure and surface morphology of the films deposit...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/08927436610035511502 |