Investigation of Transition Metal Carbides(TaC, WC and TiC) as diffusion Barriers for Cu Metallization
碩士 === 國立成功大學 === 電機工程學系 === 88 === In this thesis, the barrier properties of TaCx, WCx and TiCx films prepared by dc magnetron sputtering were investigated for the first time. According to the XRD, SEM and SIMS analyses, it was found that all the barrier films can prevent the copper from...
Main Authors: | Sheng-Tseng Hsu, 許勝宗 |
---|---|
Other Authors: | Shui-Jinn Wang |
Format: | Others |
Language: | en_US |
Published: |
2000
|
Online Access: | http://ndltd.ncl.edu.tw/handle/18508360437692582296 |
Similar Items
-
Friction and sliding wear of WC-Co inserts containing mixed carbides (TiC,TaC,NbC)
by: Van der Merwe, Roxane
Published: (2012) -
Effect of Sintering Process on Properties and Microstructure of WC-1.0TiC-3.1TaC-4.5Co Cemented Carbides
by: LI Zhong-dian, et al.
Published: (2016-12-01) -
Recycling of WC-TiC-TaC-NbC-Co by zinc melt method to manufacture new cutting tools
by: Ahmed O. Abdel-Mawla, et al.
Published: (2019-06-01) -
Study of an ultra-thin TaC diffusion barrier in the application of copper metallization
by: Wei-Li Wu, et al.
Published: (2005) -
Indentation Induced Mechanical Behavior of Spark Plasma Sintered WC-Co Cemented Carbides Alloyed with Cr<sub>3</sub>C<sub>2</sub>, TaC-NbC, TiC, and VC
by: Piotr Siwak
Published: (2021-01-01)