The Characterization of Si1-x-yGexCy Thin Films Prepared With Propane and MethylSilane Gas
碩士 === 國立成功大學 === 電機工程學系 === 88 === The advantages of narrow, variable bandgap and compatibility with IC process has made material Si1-xGex become a very important material in the applications of high speed devices and photo-electronic devices. However the compressive strain resulting from Si1-xGex...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/63720521854562535563 |