Investigation of A New Low Dielectric Constant Polymer for ULSI Applcation
碩士 === 國立交通大學 === 電子工程系 === 88 === This thesis mainly investigates the thermal stability and electric properties of a low-K material ― HOSP. The dielectric constant of the HOSP film is determined to be around 2.5, and the HOSP film is found to be thermally stable up to 500℃ obtained by FTIR analysis...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/48638169737911290872 |