Monte Carlo Simulation of Sputter Deposition
碩士 === 國立交通大學 === 電子工程系 === 88 === In this study, a computer program of Monte Carlo simulation for sputter deposition of atoms from target to substrate is developed. The sputter yield and distribution as well as the arrival flux and thickness distributions are determined. The simulation p...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2000
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/54680336077505007828 |