A Study on Ultra-Shallow Junctions Formation and Characterizations of Ti-Capped Cobalt Salicide
碩士 === 國立交通大學 === 電子工程系 === 88 === This thesis studies the characterization of ultra-shallow junctions with different formation methods and the material characterization of CoSi2 with Ti-capped staked structure. As the dimension scales down, the short channel effects become more serious....
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/15825447796315629934 |