Fabrication and Simulation of WSiN-based Embedded Material for Embedded Attenuated Phase-Shifting Mask
碩士 === 國立交通大學 === 應用化學系 === 88 === The main point of this thesis is to study the W-Si-N as a new embedded layer for EAPSM in 193nm lithography. The results are reported as follows: 1.By changing the sputtering conditions, qualified W-Si-N embedded layer could be obtained. Un...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/10300340371089850459 |