Surface Reaction of Pentakis(ethylmethylamido) tantalum
碩士 === 國立交通大學 === 應用化學系 === 88 === Tantalum nitride is one of viable candidates for copper diffusion barrier materials in copper-based interconnect technology. We have studied the surface reaction of pentakis(ethylmethyl amido) tantalum on Cu(111) surface within an UHV chambe...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/42228618235181486205 |