Preparation and Characterization of c-BN：C Thin Films
碩士 === 國立東華大學 === 材料科學與工程研究所 === 88 === Advanced ion-assisted, high-rate, reactive and pulsed-dc magnetron sputtering technique was used to deposit boron nitride (BN) films on Si , Ni, stainless substrates by sputtering a boron carbide (B4C) target in argon and nitrogen plasma. Various processing p...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/48887453459871507342 |