Study on the Buffer Layer and Recrystallization for the Growth of GaN by MOCVD

• Main Authors: Te-Chung Wang, 王德忠
• Other Authors: Ming-Kwei Lee
• Format: Others
• Language: en_US
• Published: 2000
• Online Access: http://ndltd.ncl.edu.tw/handle/97703254199994416662

碩士 === 國立中山大學 === 電機工程學系研究所 === 88 === The materials based on GaN have successfully developed on short-wavelength laser diodes (LDs), light-emitting diodes (LEDs) and ultraviolet photodetector. In this study, GaN epitaxial layers have been successfully grown on sapphire substrates. We used several methods including the nitridation temperature for substrates before growing epilayer, the growth temperature and time of buffer layer and the growth temperature of GaN epilayer to study it. From the results of the photoluminescence (PL) measured at 77K, the X-Ray diffraction measurement, SEM cross sectional views to realize the characteristic and we get a better qualities of GaN epilayers after using the foregoing methods. In this study, the re-crystallization of the buffer layer would occur while temperature re-rise to high temperature, and the phenomenon of conglomeration influence the quality and morphology of GaN epilayers. According to the results of the experiments, we study the mechanisms of yellows luminescence and donor-acceptor pair.