Synthesis and Evaluation of Methyl Methacrylate Terpolymers as Electron Beam Resists
碩士 === 國立清華大學 === 化學工程學系 === 88 === The feature size of Integrated Circuits Semiconductor devices is getting smaller and smaller. In addition, the effects of interference and diffraction of wavelength also result in the limitation of manufacture. So, the technology of electron beam photol...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/04085146374128945047 |