Preparation of Low-Dielectric-Constant Film by Templating method
碩士 === 國立臺灣大學 === 化學工程學研究所 === 88 === The semiconductor industry is currently targeting new internal dielectric films with dielectric constant k＜3.0, and it is anticipated that as the packing density of metal lines on the semiconductors continues to increase, interlevel dielectric films with k＜2.0 w...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05849480442116206977 |