Study of Bottom Antireflective Coating Layers and Attenuated Phase Shifting Masks for Advanced Optical Lithography
博士 === 國立臺灣大學 === 光電工程學研究所 === 88 === We demonstrate a hexamethyldisiloxane (HMDSO) based BARC layer for both KrF (248 nm wavelength) and ArF (193 nm wavelength) excimer laser lithography. The suitable HMDSO films for BARC layers are obtained by varying the gas-flow rate ratio of oxygen to HMDSO in...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/89863536732615886400 |