Fabrication of UHV/RTCVD Reactor and Applications of Poly-Si、RTO、SiGe(C)
碩士 === 國立臺灣大學 === 電機工程學研究所 === 88 === With the modern ULSI technology developing, the wafer diameter become larger and larger, and the integrated cluster tools of single wafer process gradually take place of the batch process. In our work, based on the previously assemble RTCVD system, we...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2000
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/42314879894660930423 |