The Effects of Radicals in Silane Thermal Chemical Vapor Deposition
碩士 === 國立臺灣科技大學 === 化學工程系 === 88 === ABSTRACT Radicals are the major reasons for a less-than-ideal film conformality in chemical vapor deposition, CVD. Important radical species have been identified in the silane CVD after nearly 20 years of research. The recent development of rapid the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/61700773184547561656 |