Growth and mechaical properties of SiCN thin films
碩士 === 國立臺灣科技大學 === 機械工程系 === 88 === We report here the growth mechanism and the mechanical properties of a novel material SiCxNy. The nanocrystal of high nucleation density was grown by electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-CVD) and ion-beam sputtering depositi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/56256843532449333700 |