Niobium Thin Films on Silicon
碩士 === 國立臺灣科技大學 === 機械工程系 === 88 === In this study samples were prepared by sputtering method which Nb was deposited on Si(100) and Si(111) substrates, then annealed in the vacuum chamber at 400、500、600、700 and 800℃ for 1 hr, respectively. XRD and TEM were used to analyze the interfacial reactions...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/03030091261621510764 |