Nano-Scale Measurement Roughness and its Shape of Silicon-Wafer Surface

• Main Authors: Ta-Yu Huang, 黃大猷
• Other Authors: Dau-Chung Wang
• Format: Others
• Language: zh-TW
• Published: 2000
• Online Access: http://ndltd.ncl.edu.tw/handle/21509503863842301522

碩士 === 國立雲林科技大學 === 機械工程技術研究所 === 88 === A proximity fringe capacitor was used to measure the surface roughness and the shape of silicon-wafer. The proximity fringe capacitor is a high sensitive and high precision sensor that can measure distance up to nanometer scale. The measured data are analyzed to get the information of wafer roughness, flatness and warp. The high precision design and calibration of the measurement system is discussed. Mathematical models of the surface roughness, flatness and warp are explained. Measuring results are displayed graphically. Furthermore, the principle of the measurement of the fringe capacitor is discussed in detail.