Reactive Of Ion Etching For GaN
碩士 === 國防大學中正理工學院 === 電子工程研究所 === 89 === ABSTRACT Due to the progress of integrated circuit and the requirement of scaling-down, precise line-width control becomes one of the essential issues of modern semiconductor process engineering. Among those processes demands, the an...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/40953000164124061800 |