Characteristic of Tantalum-Nitride thin film Resistors
碩士 === 義守大學 === 材料科學與工程學系 === 89 === Tantalum-Nitride (Ta-N) thin films were sputtered onto the (100) crystal plane of P-type silicon substrates. The Ta/N ratios of the films were controlled by a optical emission spectrometry (OES). Phase transformations, microstructures, variation of electrical p...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/01521190364602244416 |