旋轉塗佈製程最適化研究
碩士 === 國立中興大學 === 化學工程學系 === 89 === In the present the spin coating has been broadly used for the VLSI fabrication. Although this process can be applied to produce an organic film for the micro-lithography, a useful area on the substrate is significantly reduced by the problem of edge bead. To reali...
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| Format: | Others |
| Language: | zh-TW |
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2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/00607233547223386267 |