由雙馬來醯胺製備之高溫穩定二次非線性光學高分子材料

碩士 === 國立中興大學 === 化學工程學系 === 89 === Long-term NLO stability is the most important benchmark feature of polymeric materials for photonic applications. An NLO-active polymeric material with a high Tg and extensively crosslinked network is expected to exhibit excellent long-term stability of...

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Bibliographic Details
Main Author: 張家振
Other Authors: 鄭 如 忠
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/08489430374156954366