利用變溫霍爾效應測試半導體二維系統的基本特性

碩士 === 國立中興大學 === 物理學系 === 89 === In this thesis, we study the basic transport properties of the 2D hole system (2DHS) confined in SiGe/Si hetero-structure grown by MBE. We can tune the carrier density by justing the spacer layer thickness. We use the Hall effect measurement to...

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Main Authors: CHANG, CHIA FEN, 張佳芬
Other Authors: SUEN, YU-WUU
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/65994805153308186838
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spelling ndltd-TW-089NCHU01980112016-07-06T04:10:45Z http://ndltd.ncl.edu.tw/handle/65994805153308186838 利用變溫霍爾效應測試半導體二維系統的基本特性 CHANG, CHIA FEN 張佳芬 碩士 國立中興大學 物理學系 89 In this thesis, we study the basic transport properties of the 2D hole system (2DHS) confined in SiGe/Si hetero-structure grown by MBE. We can tune the carrier density by justing the spacer layer thickness. We use the Hall effect measurement to obtain the density, and the mobility of the 2DHS. We also change the sample temperature to check the temperature dependence. It is very important to control the magnetic field and temperature during this experiment. We use a close cycle cryostat to control the temperature of samples between 10K and 295K. At each stable temperature, we sweep the magnetic field which is perpendicular to the surface of samples and use the lock-in technique to measure the resistance. Finally, from the temperature dependence of mobility, we can determine the most significant scattering mechanism at different temperature. SUEN, YU-WUU 孫允武 2001 學位論文 ; thesis 36 zh-TW
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language zh-TW
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description 碩士 === 國立中興大學 === 物理學系 === 89 === In this thesis, we study the basic transport properties of the 2D hole system (2DHS) confined in SiGe/Si hetero-structure grown by MBE. We can tune the carrier density by justing the spacer layer thickness. We use the Hall effect measurement to obtain the density, and the mobility of the 2DHS. We also change the sample temperature to check the temperature dependence. It is very important to control the magnetic field and temperature during this experiment. We use a close cycle cryostat to control the temperature of samples between 10K and 295K. At each stable temperature, we sweep the magnetic field which is perpendicular to the surface of samples and use the lock-in technique to measure the resistance. Finally, from the temperature dependence of mobility, we can determine the most significant scattering mechanism at different temperature.
author2 SUEN, YU-WUU
author_facet SUEN, YU-WUU
CHANG, CHIA FEN
張佳芬
author CHANG, CHIA FEN
張佳芬
spellingShingle CHANG, CHIA FEN
張佳芬
利用變溫霍爾效應測試半導體二維系統的基本特性
author_sort CHANG, CHIA FEN
title 利用變溫霍爾效應測試半導體二維系統的基本特性
title_short 利用變溫霍爾效應測試半導體二維系統的基本特性
title_full 利用變溫霍爾效應測試半導體二維系統的基本特性
title_fullStr 利用變溫霍爾效應測試半導體二維系統的基本特性
title_full_unstemmed 利用變溫霍爾效應測試半導體二維系統的基本特性
title_sort 利用變溫霍爾效應測試半導體二維系統的基本特性
publishDate 2001
url http://ndltd.ncl.edu.tw/handle/65994805153308186838
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