Preparation and Characterization of Polyamic acid on Positive Photoresists

碩士 === 國立成功大學 === 化學工程學系 === 89 === Hydroxy containing polyamic acid and polyimide were synthesized and their applications on the positive photoresist were investigated. Poly amic acid was prepared by polycondensa- tion of 4,4''-diamino-4''''hydroxytriphenylmethane(DHTM...

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Bibliographic Details
Main Authors: WeiChan Tseng, 曾煒展
Other Authors: J.H. Liu
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/08546014914037056877