Characterization of Sputtered TaN Diffusion Barrier
碩士 === 國立成功大學 === 材料科學及工程學系 === 89 === The primary aim of this dissertation is to study the material characteristics of sputtered Ta-N thin films and the possibility of employing Ta-N thin films as the diffusion barrier between copper and low dielectric constant (low-k) materials. The TaN thin film...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19108903037353797930 |