Investigation of fluorinated amorphous carbon films deposited by PECVD
碩士 === 國立成功大學 === 材料科學及工程學系 === 89 === Interconnect delay is a factor of performance limiting for ULSI circuits when feature size is scaled to deep submicron region. Using low dielectric constant materials for the interlayer insulator is an effective way to solve the RC time delay....
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/99264378662262762676 |