Dry Etching Process and Properties of
碩士 === 國立交通大學 === 材料科學與工程系 === 89 === High-density plasma dry etching process was used to etch sol-gel derived PZT ferroelectric thin films. Two different kinds of gas mixtures (Ar/CF4 and Cl2/BCl3) were used in this work. Etch properties such as etch rate, profile, microstructure and ele...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/54362833963411911267 |