Development of Novel Cleaning Solutions and High-k Gate Dielectrics for ULSI Applications
博士 === 國立交通大學 === 電子工程系 === 89 === In this thesis, we proposed an advanced wet chemical one-step cleaning process. A novel one-step cleaning solution had been developed for pre-gate oxide cleaning to replace the conventional RCA two-step cleaning recipe, which used ammonia/hydrogen peroxi...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60642305346661971402 |