Fabrication and Characterization of Schottky Barrier Polysilicon Thin-Film Transistors

碩士 === 國立交通大學 === 電子工程系 === 89 === In this thesis, we have proposed and demonstrated a novel poly-Si Schottky barrier thin-film transistor (SB-TFT) with field induced drain (FID). The FID SB-TFT features Co-silicided source/drain and a metal field-plate (i.e., sub-gate) lying over the pas...

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Bibliographic Details
Main Authors: Ruo Gu Huang, 黃若谷
Other Authors: Tiao-Yuan Huang
Format: Others
Language:en_US
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/46332416298206563760