The Thermal Stability of Ti/NiSi/Si and TiN/NiSi/Si Stack Structures
碩士 === 國立交通大學 === 電子工程系 === 89 === In this thesis, we have studied basic material properties of nickel silicide and some key process technology relevant to ULSI applications. First, sheet resistance behavior of Ni silicide was investigated. The degradation of sheet resistance occurred at...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75233757271781427628 |