The Study of F Doped SiO2 Films Grown by PECVD
碩士 === 國立交通大學 === 電子工程系 === 89 === We can divide the thesis into two parts. One part of the thesis studies the un-doped oxide. Another studies the F-doped oxide. We grew the thin films by the PD-240 PECVD from SAMCO International Inc and found the optimum conditions of the oxide films. Fi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/34679855963836104704 |